TentaGel® S Sieber Resin

TentaGel® resins are grafted copolymers consisting of a low crosslinked polystyrene matrix on which polyethylene glycol (PEG or POE) is grafted via an ethyl ether group which increases stability towards acid treatment and minimizes PEG-leaching. The graft copolymer shows modified physicochemical properties which are highly dominated by the PEG moiety (and no longer by the polystyrene matrix) and has hydrophobic and hydrophilic properties. These copolymers are pressure stable and can be used in batch processes as well as under continuous flow conditions. The PEG spacer is in the range of MW 3000 Da. TentaGel® resins have high diffusion rates and excellent swelling in a wide range of solvents from e.g. toluene to water. This resin contains the Sieber amide (Xanthenyl) linker attached to TentaGel® via an ether bond. It is ideal for the synthesis of partially protected peptide amides. Cleavage with only 1 % TFA in DCM - this super acid sensitive resin is well suited to generate protected peptide amide fragments. As the Sieber linker is less steric hindered compared to the Rink handle, bulky building blocks can be attached to the resin more easily and with higher yields.